Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
نویسندگان
چکیده
Hydrogen silsesquioxane (HSQ) photoresist has shown extremely high-resolution performance for electron-beam lithography and interference can be a potential candidate for...
منابع مشابه
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ژورنال
عنوان ژورنال: ACS applied polymer materials
سال: 2021
ISSN: ['2637-6105']
DOI: https://doi.org/10.1021/acsapm.1c00018